| Purity: Si 5N min. | |||
Silicon targets are mainly used to reflect the preparation of SiO2 and SiN films by magnetron sputtering. As important functional films, they have good hardness, optical and dielectric properties, wear resistance and corrosion resistance. It has a broad application in LCD transparent conductive glass, building low-e glass and microelectronics industry.
Conductivity
Types
Crystal Orientation
Surface
Roughness
Shapes
N type(P
doped) & P type(B doped)
100 or 111
Ra
1.6 μm max.
Planar & Rotary
| Processing Method | CZ(Czochralski), casting and spraying | ||
| Backing Plate | Copper or SS | ||
| Resistivity | 0.005~0.02 Ω·cm, 1~10 Ω·cm & 10 Ω·cm min | ||
| Thermal Conductivity | 149Wm-1K-1 | ||
| Availabe Specification(max.) | Sheet | L: 320mm,W: 100mm, T: 10mm | |
| Tube | T:6/8/10mm, L: 900mm | ||
| Disc | D 300mm | ||
