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Polycrystalline Silicon Target

Purity: Si 5N min.


Silicon targets are mainly used to reflect the preparation of SiO2 and SiN films by magnetron sputtering. As important functional films, they have good hardness, optical and dielectric properties, wear resistance and corrosion resistance. It has a broad application in LCD transparent conductive glass, building low-e glass and microelectronics industry.


Conductivity Types Crystal Orientation Surface Roughness Thermal Conductivity

N type(P doped)& P type(B doped)

100 or 111 Ra 1.6 μm max.

149Wm-1K-1


Resistivity 0.005~0.02 Ω·cm, 1~10  Ω·cm & 10 Ω·cm min.
Processing Method CZ(Czochralski)
Shapes Round, Square, Ring, Cone & Rectangle
Available Dimensions Round Shape: Dia.450mm max*Thickness
Rectangle Shape: 580mmx127mm max*Thickness